BS-80020CPPS等离子体源

BS-80020CPPS等离子体源

BS-80020CPPS是用于辅助低温（100℃以下等）下塑料基板和胶片成膜的等离子体源。

The plasma source in this product series is specialized for processes with a low temperature, such as plastic film or substrate. The film quality of vacuum deposited film can be improved by deposition assisted by plasma, with lower temperature increases of a substrate. The item can also be used for plasma treatment, such as for surface modification and cleaning. .
本系列产品是专门为等离子源与低温过程，如塑料膜或基板。真空薄膜质量的沉积膜可以通过沉积以等离子体辅助改善，随着衬底温度的升高降低。该项目也可用于等离子体处理，如表面改性和清洗。。
The reflective deposition is made possible by electron beam-excited plasma, while the ARE technique (Activated Reactive Evaporation) promotes a highly effective discharge, in order to enhance the evaporation materials ionization. There are multiple modes of operation, including a CPPS mode, as well as a normal plasma mode.
反射的沉积是由电子束激发的等离子体成为可能，而技术（活性反应蒸发）促进高效放电，为了提高蒸发物质电离。有多种操作模式，包括当前的模式，以及正常的等离子体模式。

Features特性

BS-80020CPPS Plasma Source for Low-temperature Process

This plasma source is specialized for low-temperature process, for example for a plastic substrate/film. Film quality of vacuum deposited film can be improved by plasma assisted deposition with lowering temperature increase of a substrate. And can also be used for plasma treatment such as cleaning and surface modification.

Can form high density oxide films in a low-temperature process. 

Reactive deposition by electron beam excited plasma, associated with ion-assistant effects.

Activated Reactive Evaporation (ARE) technique, promoting highly effective discharge above crucible, to enhance ionization of evaporation materials.

Selectable from CPPS mode, for low-temperature process, and normal plasma mode.

Retrofit to an existing vacuum chamber is possible. 

技术规格：

zei大放电输出	3.2kW (160V, 20A)
zei大辅助输出功率	2kW (200V, 10A)
工作压力	8×10-3 ～ 8×10-2Pa (Ar, O2, N2 气氛)
放电气体(Ar)	8 ～  20mL/分
适用控制电源	BS-92040CPPC

BS-80020CPPS等离子体源由日本电子株式会社(JEOL) 为您提供，如您想了解更多关于BS-80020CPPS等离子体源报价、参数等信息 ，欢迎来电或留言咨询。